Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry

Type:
Journal
Info:
Applied Surface Science 328 (2015) 344 - 348
Date:
2014-12-08

Author Information

Name Institution
Triratna MuneshwarUniversity of Alberta
Kenneth C. CadienUniversity of Alberta

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Dielectric Constant, Permittivity
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Silicon

Notes

In situ ellipsometry study of ZrN PEALD with Kurt J. Lesker ALD150LX.
341