Publication Information

Title: Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Electrochemical and Solid-State Letters, 7(8) F45-F48(2004)

Date: 2003-12-02

DOI: http://dx.doi.org/10.1149/1.1756541

Author Information

Name

Institution

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Films

Plasma Al2O3 using Custom

Deposition Temperature Range = 100-350C

75-24-1

7782-44-7

7727-37-9

Thermal Al2O3 using Custom

Deposition Temperature Range = 100-350C

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Unknown

Flat Band Voltage Shift

C-V, Capacitance-Voltage Measurements

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Etch Rate

Wet Etch

Unknown

Substrates

Si(100)

ITO

Keywords

High-k Dielectric Thin Films

Notes

Custom CCP electrical properties comparison for PEALD and thermal ALD Al2O3.

183

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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