Publication Information

Title: Structural and optical characterization of low-temperature ALD crystalline AlN

Type: Journal

Info: Journal of Crystal Growth 421 (2015) 45 - 52

Date: 2015-04-07

DOI: http://dx.doi.org/10.1016/j.jcrysgro.2015.04.009

Author Information

Name

Institution

University of Alberta

University of Alberta

Films

Deposition Temperature = 250C

75-24-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000D

Optical Properties

Ellipsometry

J.A. Woollam M-2000D

Density

XRR, X-Ray Reflectivity

Bruker D8 Discover

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Kratos Analytical Axis Ultra DLD

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Bruker IR Spectrometer

Substrates

Si(100)

Si(111)

Sapphire

Keywords

Notes

357

Disclaimer

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