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Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (32), pp 20865-20871
Date:
2016-07-22
Author Information
| Name | Institution |
|---|---|
| Jae-Min Park | Sejong University |
| Se Jin Jang | DNF Co. Ltd. |
| Luchana L. Yusup | Sejong University |
| Won-Jun Lee | Sejong University |
| Sang-Ick Lee | DNF Co. Ltd. |
Films
Plasma SiNx
Film/Plasma Properties
Characteristic: Precursor Vapor Pressure
Analysis: Vapor Pressure
Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Flat Band Voltage Shift
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Substrates
| Si(100) |
Notes
| 796 |