Publication Information

Title: Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction

Type: Other

Info: HP Laboratories Technical Report

Date: 2015-07-21

DOI: http://www.hpl.hp.com/techreports/2015/HPL-2015-60.html

Author Information

Name

Institution

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Films

Plasma SiO2 using Unknown

Deposition Temperature Range N/A

15112-89-7

7782-44-7

Plasma SiNx using Unknown

Deposition Temperature Range N/A

15112-89-7

7727-37-9

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Silicon

Keywords

Notes

384

Disclaimer

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