Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD

Type:
Poster
Info:
ALD 2008 Poster
Date:
2008-07-02
DOI:
No DOI

Author Information

Name Institution
Qi FangOxford Instruments
Chris HodsonOxford Instruments

Films


Plasma SiO2


Plasma SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Etch Rate
Analysis: Wet Etch

Substrates

Notes

120