Publication Information

Title: XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

Type: Journal

Info: Applied Surface Science 315 (2014) 104-109

Date: 2014-07-18

DOI: http://dx.doi.org/10.1016/j.apsusc.2014.07.105

Author Information

Name

Institution

University of Alberta

Films

Deposition Temperature = 250C

75-24-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

200

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