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Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34(1) 2016
Date:
2015-11-10
Author Information
| Name | Institution |
|---|---|
| Małgorzata Sowińska | Brandenburg University of Technology |
| Karsten Henkel | Brandenburg University of Technology |
| Dieter Schmeißer | Brandenburg University of Technology |
| Irina Kärkkänen | Sentech Instruments GmbH |
| Jessica Schneidewind | Sentech Instruments GmbH |
| Franziska Naumann | Sentech Instruments GmbH |
| Bernd Gruska | Sentech Instruments GmbH |
| Hassan Gargouri | Sentech Instruments GmbH |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Substrates
| Si(001) |
Notes
| Oxygen in the TDMAT/N2 process comes from residual water and oxygen in the chamber. |
| 415 |