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Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
Type:
Journal
Info:
Japanese Journal of Applied Physics, Vol. 46, No. 7A, 2007, pp. 4085-4088
Date:
2007-07-04
Author Information
| Name | Institution |
|---|---|
| Seungchan Cho | Pusan National University |
| Keunwoo Lee | Hanyang University |
| Pungkeun Song | Pusan National University |
| Hyeongtag Jeon | Hanyang University |
| Yangdo Kim | Pusan National University |
Films
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Unknown
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Unknown
Analysis: Etch Pit Test
Characteristic: Unknown
Analysis: Anneal
Characteristic: Barrier Characteristics
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Barrier Characteristics
Analysis: XRD, X-Ray Diffraction
Characteristic: Barrier Characteristics
Analysis: Etch Pit Test
Substrates
| p-type SOI(100) |
Notes
| Substrates pirahna and HF cleaned |
| 21 |