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Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 9 (8) C123-C125 (2006)
Date:
2006-03-28
Author Information
| Name | Institution |
|---|---|
| Eun-Jeong Kim | Chonnam National University |
| Do-Heyoung Kim | Chonnam National University |
Films
Plasma HfNx
Plasma HfNx
Plasma HfNx
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
| SiO2 |
Notes
| 1309 |