Your search for plasma enhanced atomic layer deposition publications discussing HfNx films returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films|
|2||Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition|
|3||Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique|
|4||HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer|
|5||Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition|
I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: firstname.lastname@example.org
© 2014-2017 plasma-ald.com