Publication Information

Title: The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition

Type: Journal

Info: Journal of Crystal Growth Vol.335(1):51-57.

Date: 2011-11-15

DOI: http://dx.doi.org/10.1016/j.jcrysgro.2011.09.003

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature Range = 100-400C

75-24-1

7664-41-7

Deposition Temperature Range = 100-400C

75-24-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Microstructure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Microstructure

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Interlayer

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Asylum Research MFP-3D

Optical Properties

Optical Transmission

Cary Varian 100 UV-Vis Spectrometer

Optical Properties

Optical Absorption

Cary Varian 100 UV-Vis Spectrometer

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Phonon Modes

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Vertex 70

Chemical Composition, Impurities

XRR, X-Ray Reflectivity

Unknown

Substrates

Si(100)

Si(111)

Sapphire

Quartz

Keywords

AlN

PEALD Film Development

Optical

Notes

Ultratech Fiji PEALD AlN film development.

156

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