Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Cambridge NanoTech Fiji hardware returned 155 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
2Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
3ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
4ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
5ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
6ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
7AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
8AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
9Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
10Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
11Annealing behavior of ferroelectric Si-doped HfO2 thin films
12Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
13Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
14Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
15Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
16Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
17Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
18Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
19Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
20Atomic layer deposition of GaN at low temperatures
21Atomic Layer Deposition of the Solid Electrolyte LiPON
22Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
23Atomic layer epitaxy for quantum well nitride-based devices
24Band alignment of Al2O3 with (-201) β-Ga2O3
25Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
26Biofilm prevention on cochlear implants
27Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
28Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
29Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
30Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
31Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
32Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
33Damage evaluation in graphene underlying atomic layer deposition dielectrics
34Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
35DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
36Demonstration of flexible thin film transistors with GaN channels
37Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
38Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
39Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
40Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
41Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
42Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
43Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
44Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
45Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
46Electrical characteristics of β-Ga2O3 thin films grown by PEALD
47Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
48Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
49Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
50Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
51Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
52Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
53Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
54Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
55Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
56Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
57Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
58Fully CMOS-compatible titanium nitride nanoantennas
59GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
60Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
61Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
62High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
63High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
64Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
65Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
66Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
67Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
68Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
69Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
70Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
71Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
72Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
73Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
74Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
75Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
76Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
77Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
78Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
79Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
80Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
81Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
82Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
83Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
84Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
85Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
86Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
87Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
88Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
89Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
90Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
91Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
92Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
93Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
94Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
95Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
96Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
97Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
98Metal-semiconductor-metal ultraviolet photodetectors based on gallium nitride grown by atomic layer deposition at low temperatures
99Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
100Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
101New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
102Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
103Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
104Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
105Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
106Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
107Passivation effects of atomic-layer-deposited aluminum oxide
108Perspectives on future directions in III-N semiconductor research
109Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
110Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
111Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
112Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
113Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
114Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
115Plasma-enhanced atomic layer deposition of superconducting niobium nitride
116Plasma-enhanced atomic layer deposition of tungsten nitride
117Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
118Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
119Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
120Programmable on-chip DNA compartments as artificial cells
121Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
122Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
123Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
124Self-Limiting Growth of GaN at Low Temperatures
125Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
126Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
127Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
128Single-Cell Photonic Nanocavity Probes
129Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
130Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
131Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
132Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
133Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
134Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
135Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
136Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
137Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
138Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
139Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
140Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
141TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
142Template-assisted synthesis of III-nitride and metal-oxide nano-heterostructures using low-temperature atomic layer deposition for energy, sensing, and catalysis applications (Presentation Recording)
143Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
144The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
145The effects of layering in ferroelectric Si-doped HfO2 thin films
146The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
147The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
148The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
149The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
150The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
151Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
152Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
153Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
154Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
155Using top graphene layer as sacrificial protection during dielectric atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com