Publication Information

Title: Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition

Type: Conference Proceedings

Info: ECS Trans. 2015 66(5): 269-275

Date: 2015-10-16

DOI: http://ma.ecsdl.org/content/MA2015-01/20/1352.short

Author Information

Name

Institution

Tyndall National Institute, University College Cork

National Institute of Materials Physics

National Institute of Materials Physics

Tyndall National Institute, University College Cork

Tyndall National Institute, University College Cork

Tyndall National Institute, University College Cork

Tyndall National Institute, University College Cork

Tyndall National Institute, University College Cork

Tyndall National Institute, University College Cork

Films

Deposition Temperature = 250C

19962-11-9

15112-89-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Morphology, Roughness, Topography

TEM, Transmission Electron Microscope

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Raman Spectroscopy

Unknown

Chemical Composition, Impurities

ELS, EELS, Electron Energy Loss Spectroscopy

Unknown

Hysteresis

C-V, Capacitance-Voltage Measurements

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Substrates

Ti

Keywords

Capacitors

Notes

492

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