3DMAS, Tris(DiMethylAmido)Silane, CAS# 15112-89-7

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tris(dimethylamino)silane, 99+%
2Strem Chemicals, Inc.Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 40 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1AlSixOyComposite materials and nanoporous thin layers made by atomic layer deposition
2AlSixOyNanoporous SiO2 thin films made by atomic layer deposition and atomic etching
3HfSiOxAnnealing behavior of ferroelectric Si-doped HfO2 thin films
4HfSiOxEffect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
5HfSiOxFerroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
6HfSiOxInfluence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
7HfSiOxOptical properties and bandgap evolution of ALD HfSiOx films
8HfSiOxTaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
9HfSiOxThe effects of layering in ferroelectric Si-doped HfO2 thin films
10SiAlNPlasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
11SiNxCorrelation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
12SiNxPlasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
13SiNxSilicon Nitride and Silicon Oxide Thin Films by Plasma ALD
14SiNxSteady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
15SiNxThermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
16SiO2Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
17SiO2Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
18SiO2Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
19SiO2Comparative study of ALD SiO2 thin films for optical applications
20SiO2Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
21SiO2Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
22SiO2High-Reflective Coatings For Ground and Space Based Applications
23SiO2Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
24SiO2Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
25SiO2Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
26SiO2Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
27SiO2Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
28SiO2Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
29SiO2Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
30SiO2Optical properties and bandgap evolution of ALD HfSiOx films
31SiO2Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
32SiO2Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
33SiO2Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
34SiO2Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
35SiO2Single-Cell Photonic Nanocavity Probes
36SiO2Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
37SiO2Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
38SiO2Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
39SiO2Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
40SiO2Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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