3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
3EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
5DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
6GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Annealing behavior of ferroelectric Si-doped HfO2 thin films
2Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
3Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
5Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
6Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
7Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
8Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
9Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
10Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
11Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
12Optical properties and bandgap evolution of ALD HfSiOx films
13Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
14Optical properties and bandgap evolution of ALD HfSiOx films
15Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
16Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
17Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
18Single-Cell Photonic Nanocavity Probes
19Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
20Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
21Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
22Comparative study of ALD SiO2 thin films for optical applications
23Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
24Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
25Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
26Composite materials and nanoporous thin layers made by atomic layer deposition
27Atomic layer deposition of metal-oxide thin films on cellulose fibers
28Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
29Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
30Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
31Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
32Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
33Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
34Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
35An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
36Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
37Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
38Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
39Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
40High-Reflective Coatings For Ground and Space Based Applications
41Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
42Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
43Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
44Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
45TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
46Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
47Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
48Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
49Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
50Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
51Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
52Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
53Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
54Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
55HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
563D structure evolution using metastable atomic layer deposition based on planar silver templates
57Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
58Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
59Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
60Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
61Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
62Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
63Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
64Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
65Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
66Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
67Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
68The effects of layering in ferroelectric Si-doped HfO2 thin films
69Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
70Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
71Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells