Publication Information

Title: Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application

Type: Journal

Info: J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012

Date: 2011-10-17

DOI: http://dx.doi.org/10.1116/1.3669521

Author Information

Name

Institution

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Facult├ęs Universitaires Notre-Dame de la Paix

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Facult├ęs Universitaires Notre-Dame de la Paix

Universite catholique de Louvain (UCL)

Films

Deposition Temperature Range = 25-250C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Fixed Charge

C-V, Capacitance-Voltage Measurements

Unknown

Minority Carrier Lifetime

QSSPC, Quasi-Steady-State PhotoConductance Decay

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Substrates

Silicon

Butterfly Wing

Keywords

Passivation

Thin Film Solar Cell

Notes

Ultratech Fiji PEALD Al2O3 for silicon solar cell passivation layer and butterfly wing-like anti-reflection structure.

153

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com