Publication Information

Title: Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition

Type: Journal

Info: J. Vac. Sci. Technol. A 30(2), Mar/Apr 2012

Date: 2012-02-17

DOI: http://dx.doi.org/10.1116/1.3687937

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature Range N/A

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Optical Properties

PL, PhotoLuminescence

Cary Eclipse Fluoresence Spectrophotometer

Optical Properties

Optical Transmission

Cary Varian 100 UV-Vis Spectrometer

Chemical Binding

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Vertex 70

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Thickness

Ellipsometry

J.A. Woollam

Refractive Index

Ellipsometry

J.A. Woollam

Substrates

Si(100)

Si(111)

Quartz

Sapphire

Keywords

Optical

Notes

TMA decomposition above 300 (ref 11).

Si RCA cleaned + HF dip.

96

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