Publication Information

Title: Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks

Type: Journal

Info: ECS J. Solid State Sci. Technol. 2013 volume 2, issue 12, P524-P528

Date: 2013-10-12

DOI: http://dx.doi.org/10.1149/2.005312jss

Author Information

Name

Institution

National Taiwan University

National Taiwan University

National Taiwan University

National Taiwan University

National Taiwan University

Films

Deposition Temperature = 250C

175923-04-3

7782-44-7

Deposition Temperature = 250C

75-24-1

7782-44-7

Deposition Temperature = 250C

75-24-1

7782-44-7

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Interface State Density

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Thickness

TEM, Transmission Electron Microscope

Unknown

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Effective Oxide Charge, Qeff

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Substrates

Si(100)

Keywords

Notes

Substrates HF dipped.

133

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