Publication Information

Title: Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide

Type: Journal

Info: J. Phys. Chem. C, 2014, 118(48), pp 27749-27753

Date: 2014-11-06

DOI: http://dx.doi.org/10.1021/jp509298r

Author Information

Name

Institution

University of Maryland

University of Maryland

University of Maryland

University of Maryland

University of Maryland

University of Maryland

University of Maryland

Films

Deposition Temperature Range = 240-300C

1907-33-1

7732-18-5

Deposition Temperature Range = 225-300C

1907-33-1

7782-44-7

Deposition Temperature = 225C

1907-33-1

7732-18-5

Deposition Temperature Range = 225-300C

1907-33-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Kratos Analytical Axis Ultra DLD

Thickness

Ellipsometry

J.A. Woollam M-2000D

Thickness

TEM, Transmission Electron Microscope

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Substrates

Silicon

Keywords

Lithium-ion

Batteries

PEALD Film Development

Notes

Ultratech Fiji (PE)ALD Li2O, LiOH, and Li2CO3 for Li-ion battery electrode study.

TEM images in supplemental materieals.

Silicon substrates cleaned with acetone, methanol, IPA, and N2.

158

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