Water, H2O, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 201 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1Al:ZnOAtomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
2Al:ZnOEncapsulation method for atom probe tomography analysis of nanoparticles
3Al:ZnOMetal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
4Al2O31D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5Al2O3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
6Al2O3A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
7Al2O3A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
8Al2O3A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
9Al2O3AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
10Al2O3AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
11Al2O3AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
12Al2O3AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
13Al2O3Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
14Al2O3Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
15Al2O3Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
16Al2O3Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
17Al2O3AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
18Al2O3Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
19Al2O3Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
20Al2O3Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
21Al2O3Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
22Al2O3Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
23Al2O3Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
24Al2O3Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
25Al2O3Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
26Al2O3Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
27Al2O3Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
28Al2O3Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
29Al2O3Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
30Al2O3Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
31Al2O3Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
32Al2O3Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
33Al2O3Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
34Al2O3Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
35Al2O3Experimental verification of electro-refractive phase modulation in graphene
36Al2O3Fast Flexible Plastic Substrate ZnO Circuits
37Al2O3Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
38Al2O3Gate Insulator for High Mobility Oxide TFT
39Al2O3Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
40Al2O3Hafnia and alumina on sulphur passivated germanium
41Al2O3High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
42Al2O3Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
43Al2O3Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
44Al2O3Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
45Al2O3Improved understanding of recombination at the Si/Al2O3 interface
46Al2O3Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
47Al2O3In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
48Al2O3Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
49Al2O3Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
50Al2O3Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
51Al2O3Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
52Al2O3Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
53Al2O3Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
54Al2O3Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
55Al2O3Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
56Al2O3Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
57Al2O3Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
58Al2O3Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
59Al2O3Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
60Al2O3Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
61Al2O3Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
62Al2O3MANOS performance dependence on ALD Al2O3 oxidation source
63Al2O3Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
64Al2O3Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
65Al2O3Nitride passivation of the interface between high-k dielectrics and SiGe
66Al2O3Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
67Al2O3On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
68Al2O3Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
69Al2O3Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
70Al2O3Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
71Al2O3Passivation effects of atomic-layer-deposited aluminum oxide
72Al2O3Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
73Al2O3Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
74Al2O3Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
75Al2O3Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
76Al2O3Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
77Al2O3Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
78Al2O3Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
79Al2O3RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
80Al2O3Single-Cell Photonic Nanocavity Probes
81Al2O3Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
82Al2O3Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
83Al2O3Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
84Al2O3Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
85Al2O3Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
86Al2O3Symmetrical Al2O3-based passivation layers for p- and n-type silicon
87Al2O3Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
88Al2O3Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
89Al2O3Trapped charge densities in Al2O3-based silicon surface passivation layers
90Al2O3Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
91Al2O3Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
92Al2O3Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
93Al2O3Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
94AlONOxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
95AlONPlasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
96AuAtomic Layer Deposition of Gold Metal
97BaTiO3Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
98Dy2O3Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
99Er:Al2O3Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
100Er2O3Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
101Ga:ZnOThe Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
102Ga2O3Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
103Ga2O3Plasma enhanced atomic layer deposition of Ga2O3 thin films
104Ga2O3Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
105Ga2O3RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
106HfAlOxA comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
107HfO2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
108HfO2An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
109HfO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
110HfO2Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
111HfO2Breakdown and Protection of ALD Moisture Barrier Thin Films
112HfO2Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
113HfO2Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
114HfO2Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
115HfO2Hafnia and alumina on sulphur passivated germanium
116HfO2High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
117HfO2High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
118HfO2Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
119HfO2Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
120HfO2Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
121HfO2Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
122HfO2Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
123HfO2On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
124HfO2Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
125HfO2Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
126HfO2Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
127HfO2Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
128HfO2Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
129HfO2Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
130HfO2Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
131HfO2Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
132HfO2Symmetrical Al2O3-based passivation layers for p- and n-type silicon
133HfO2The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
134HfO2Trapped charge densities in Al2O3-based silicon surface passivation layers
135HfO2Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
136HfONElectrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
137HfONEnhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
138In2(S,O)3Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
139La2O3Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
140Li2OAtomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
141LiOHAtomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
142LiPONAtomic Layer Deposition of the Solid Electrolyte LiPON
143LiPONSolid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
144MgOPlasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
145MgOStructural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
146MnOxDeposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
147Nb2O5Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
148SiO2Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
149SnO2Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
150SnO2Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
151SrOLow-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
152Ta2O5Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
153Ta2O5Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
154Ta2O5Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
155Ta2O5Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
156TaNbOxRole of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
157TiO2A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
158TiO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
159TiO2Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
160TiO2Breakdown and Protection of ALD Moisture Barrier Thin Films
161TiO2Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
162TiO2Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
163TiO2Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
164TiO2In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
165TiO2Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
166TiO2Low temperature temporal and spatial atomic layer deposition of TiO2 films
167TiO2Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
168TiO2Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
169TiO2Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
170TiO2Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
171TiO2Room temperature atomic layer deposition of TiO2 on gold nanoparticles
172TiO2Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
173TiO2Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
174TiO2Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
175TiO2Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
176TiO2Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
177TiO2X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
178V2O5Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
179V2O5Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
180WO3Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
181ZnOAtomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
182ZnOComparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
183ZnOEffect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
184ZnOHighly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
185ZnOLow-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
186ZnOMetal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
187ZnONew approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
188ZnOStructural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
189ZnOSustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
190ZnOThe effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
191ZnOThe Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
192ZnOWetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
193ZnONLocal Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
194ZnONUltraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
195ZrO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
196ZrO2Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
197ZrO2Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
198ZrO2RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
199ZrO2Single-Cell Photonic Nanocavity Probes
200ZrO2Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
201ZrO2Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com