Publication Information

Title: Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems

Type: Journal

Info: JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 21, NO.6, 2012

Date: 2012-07-17

DOI: http://dx.doi.org/10.1109/JMEMS.2012.2211578

Author Information

Name

Institution

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Cranfield University

Cranfield University

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Films

Deposition Temperature Range = 25-250C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

Unknown

Fixed Charge

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Interface State Density

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Substrate Impurity Concentration

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Midgap Voltage

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Substrates

Si(100)

Keywords

Radiation Hardness

Notes

643

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