Publication Information

Title: Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition

Type: Journal

Info: Thin Solid Films 520 (2012) 2750-2755

Date: 2011-11-28

DOI: http://dx.doi.org/10.1016/j.tsf.2011.11.081

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature Range = 100-500C

75-24-1

7664-41-7

Deposition Temperature Range = 300-500C

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Thickness

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Microstructure

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Images

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Extinction Coefficient

Ellipsometry

J.A. Woollam VASE

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

FEI Tecnai G2 F30

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Asylum Research MFP-3D

Optical Properties

Spectrophotometry

Cary Varian 100 UV-Vis Spectrometer

Substrates

Si(100)

Si(111)

Sapphire

GaN

Glass

Pyrex

Keywords

PEALD Film Development

Notes

Samples ultrasonic cleaned with 2-propanol, acetone, methanol, and DI water followed by HF, DI, and N2.

Ultratech Fiji PEALD AlN film development.

154

Disclaimer

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