Publication Information

Title: Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes

Type: Journal

Info: Journal of Applied Physics 116, 024508 (2014)

Date: 2014-06-02

DOI: http://dx.doi.org/10.1063/1.4889798

Author Information

Name

Institution

Oregon State University

Intel Corporation

Intel Corporation

Oregon State University

Oregon State University

Oregon State University

Films

Deposition Temperature Range N/A

3236-82-6

7732-18-5

Deposition Temperature Range N/A

6074-84-6

7732-18-5

Deposition Temperature Range N/A

175923-04-3

7732-18-5

Deposition Temperature Range N/A

352535-01-4

7732-18-5

Deposition Temperature Range N/A

75-24-1

7732-18-5

Deposition Temperature Range N/A

15112-89-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Band Gap

REELS, Reflection Electron Energy Loss Spectroscopy

Unknown

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

I-V Plots

I-V, Current-Voltage Measurements

Agilent 4156B

Band Defects

REELS, Reflection Electron Energy Loss Spectroscopy

Unknown

Substrates

ZCAN (ZrCuAlNi)

Keywords

MIM Diode

Notes

No annealing to avoid crystallization of ALD films or ZCAN substrate.

136

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