Plasma-enhanced atomic layer deposition of tungsten nitride

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 051516 (2016)
Date:
2016-08-12

Author Information

Name Institution
Mark J. SowaCambridge NanoTech
Yonas YemaneStanford University
Fritz B. PrinzStanford University
J ProvineStanford University

Films



Plasma WN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(100)
SiO2

Notes

901