Publication Information

Title: Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures

Type: Journal

Info: physica status solidi (a) Volume 209, Issue 2, pages 266--271, 2012

Date: 2011-11-03

DOI: http://dx.doi.org/10.1002/pssa.201127430

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature Range = 100-500C

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Extinction Coefficient

Ellipsometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Thickness

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Images

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Substrates

Si(100)

Keywords

Notes

697

Disclaimer

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