Publication Information

Title: Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films

Type: Journal

Info: J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015

Date: 2014-10-07

DOI: http://dx.doi.org/10.1116/1.4898434

Author Information

Name

Institution

University of Twente

University of Twente

University of Twente

University of Twente

University of Twente

University of Twente

University of Twente

Films

Plasma AlN using Picosun R200

Deposition Temperature = 350C

75-24-1

7664-41-7

Plasma AlN using Picosun R200

Deposition Temperature = 350C

75-24-1

7727-37-9

1333-74-0

Thermal AlN using Picosun R200

Deposition Temperature = 350C

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Refractive Index

Ellipsometry

J.A. Woollam M-2000

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Substrates

Keywords

Notes

Picosun plasma and thermal AlN study.

176

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