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Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Technical Physics Letters, 2017, Vol. 43, No. 1, pp. 74-77.
Date:
2016-07-12
Author Information
| Name | Institution |
|---|---|
| V. A. Tarala | North-Caucasus Federal University |
| A. S. Altakhov | North-Caucasus Federal University |
| M. Ambartsumov | North-Caucasus Federal University |
| V. Ya. Martens | North-Caucasus Federal University |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| Sapphire |
Notes
| 1182 |