Beneq TFS-200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-200 hardware returned 67 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
2Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
3Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
4Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
5Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
6Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
7Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
8Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
9Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
10A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
11Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
12MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
13Residual stress study of thin films deposited by atomic layer deposition
14Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
15Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
16Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
17Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
18Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
19Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
20Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
21Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
22Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
23Plasma-Modified Atomic Layer Deposition
24Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
25In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
26Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
27Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
28Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
29Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
30Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
31Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
32Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
33MANOS performance dependence on ALD Al2O3 oxidation source
34The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
35Modal properties of a strip-loaded horizontal slot waveguide
36Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
37Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
38Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
39Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
40Nitride passivation of the interface between high-k dielectrics and SiGe
41The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
42Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
43Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
44Low temperature temporal and spatial atomic layer deposition of TiO2 films
45Tribological properties of thin films made by atomic layer deposition sliding against silicon
46Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
47Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
48Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
49Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
50Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
51Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
52Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
53Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
54Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
55Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
56Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
57Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
58Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
59Optical properties and bandgap evolution of ALD HfSiOx films
60Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
61Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
62Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
63Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
64Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
65Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
66Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
67Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide