Publication Information

Title: Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals

Type: Journal

Info: Journal of the Korean Physical Society, Vol. 57, No. 4, pp. 806--811

Date: 2010-07-29

DOI: https://inis.iaea.org/search/search.aspx?orig_q=RN:44096233

Author Information

Name

Institution

Korea Institute of Materials Science

Dankook University

Films

Deposition Temperature Range = 150-350C

7550-45-0

1333-74-0

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Thickness

Profilometry

Tencor Instruments 200

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Substrates

SiO2

Keywords

Notes

725

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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