Publication Information

Title: Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy

Type: Journal

Info: Chem. Mater. 2016, 28, 5864-5871

Date: 2016-07-20

DOI: http://dx.doi.org/10.1021/acs.chemmater.6b02319

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma SiNx using Custom ICP

Deposition Temperature Range = 85-275C

186598-40-3

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Gas Phase Species

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Optics Vector 22

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Optics Vector 22

Plasma Species

OES, Optical Emission Spectroscopy

Ocean Optics UBS 4000-UV-VIS

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Thickness

Ellipsometry

J.A. Woollam M-2000U

Refractive Index

Ellipsometry

J.A. Woollam M-2000U

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Unknown

Substrates

Si(100)

Keywords

Notes

836

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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