Publication Information

Title: Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition

Type: Journal

Info: Applied Surface Science, Volume 330, 1 March 2015, Pages 476-486

Date: 2014-12-31

DOI: http://dx.doi.org/10.1016/j.apsusc.2014.12.197

Author Information

Name

Institution

Eindhoven University of Technology

Films

Deposition Temperature Range N/A

546-68-9

7782-44-7

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Ellipsometry

J.A. Woollam M-2000U

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Quanta 3D FEG

Morphology, Roughness, Topography

TEM, Transmission Electron Microscope

JEM ARM 200

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D4 Endeavor

Substrates

Keywords

Photocatalyst

Doping

Notes

Oxford Instruments FlexAL PEALD TiON for photocatalysis application.

270

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