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Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
Type:
Thesis
Info:
Niskanen Thesis
Date:
2006-11-10
DOI:
No DOI
Author Information
| Name | Institution |
|---|---|
| Antti Niskanen | University of Helsinki |
| Timo T. Hatanpää | University of Helsinki |
| Kai Arstila | University of Helsinki |
| Markku A. Leskelä | University of Helsinki |
| Mikko K. Ritala | University of Helsinki |
Films
Plasma Ag
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis
Substrates
| Glass |
| Silicon |
Notes
| Plasma source limitations require it to be kept on during the entire run with slow power ramping between high and low powers. |
| Portion of the reactor was replaced by polycarbonate to be compatible with the plasma source. |
| Used Sairem SURF451 surfatron plasma source. |
| 83 |