Publication Information

Title: Room-Temperature Atomic Layer Deposition of Platinum

Type: Journal

Info: Chem. Mater., 2013, 25 (9), pp 1769-1774

Date: 2013-03-18

DOI: http://dx.doi.org/10.1021/cm400274n

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Pt using Custom ICP

Deposition Temperature Range N/A

94442-22-5

7782-44-7

1333-74-0

Other Pt using Custom ICP

Deposition Temperature Range N/A

94442-22-5

7782-44-7

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000U

Deposition Kinetics, Reaction Mechanism

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Optics Vector 22

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Morphology, Roughness, Topography

XRD, X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Thickness

Ellipsometry

Unknown

Unknown

EDS, EDX, Energy Dispersive X-ray Spectroscopy

FEI Nova

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

NT-MDT Solver P47SPM

Substrates

PEN, Polyethylene Napthalate

PET, Polyethylene Terephthalate

Paper

Cotton

SiO2

Al2O3

Keywords

Notes

114

Disclaimer

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