Publication Information

Title: Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment

Type: Journal

Info: J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015

Date: 2014-12-08

DOI: http://dx.doi.org/10.1116/1.4904503

Author Information

Name

Institution

University of Cologne

University of Cologne

University of Cologne

University of Cologne

Technische Universit├Ąt Berlin

Films

Thermal TiO2 using Beneq TFS-200

Deposition Temperature Range = 120-250C

546-68-9

7732-18-5

Other TiO2 using Beneq TFS-200

Deposition Temperature Range = 120-250C

546-68-9

7732-18-5

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Photoelectrochemical (PEC) Activity

Linear Sweep Voltammetry

Custom

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Surface Science Instruments ESCA M-Probe

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Surface Science Instruments ESCA M-Probe

Photocurrent

Photocurrent Measurements

PerkinElmer lambda 950 Spectrophotometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

STOE & Cie. GmbH XRD

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Nova NanoSEM 430

Thickness

SEM, Scanning Electron Microscopy

JEOL 7401

Resistivity, Sheet Resistance

Two-point Probe

Keithley 6517B

Unknown

Raman Spectroscopy

Renishaw Microspectrometer

Optical Bandgap

Unknown

Unknown

Substrates

FTO, F:SnO2

Keywords

Photoelectrochemical (PEC) water splitting

Notes

Impact of H2 plasma treatment of Beneq TFS 200 thermal ALD TiO2 for photoelectrochemical water splitting.

Beneq TFS-200 used for thermal ALD of TiO2. H2 plasma exposure done on different, unspecified hardware.

173

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