The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
Type:
Journal
Info:
physica status solidi (a) Volume 216, Issue 17, pages 1900306
Date:
2019-07-05
Author Information
| Name | Institution |
|---|---|
| Svetlana Beljakowa | Friedrich-Alexander University Erlangen-Nuremberg |
| Peter Pichler | Fraunhofer Institute for Integrated Systems and Device Technology (IISB) |
| Bodo Kalkofen | University of Magdeburg |
| René Hübner | Helmholtz-Zentrum Dresden-Rossendorf |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
Notes
| 1582 |