Publication Information

Title: Study on the characteristics of aluminum thin films prepared by atomic layer deposition

Type: Journal

Info: J. Vac. Sci. Technol. A 20(6), Nov/Dec 2002

Date: 2002-11-01

DOI: http://dx.doi.org/10.1116/1.1513636

Author Information

Name

Institution

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Films

Plasma Al using Custom

Deposition Temperature = 250C

75-24-1

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Profilometry

Tencor Alpha-Step Profilometer

Thickness

TEM, Transmission Electron Microscope

Unknown

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Substrates

TiN

Keywords

Interconnect

Notes

Description of why TMA forms dimer.

TMA vapor pressure = 1117 Pa at room T.

Pyrolytic decomposition temperature >350C with references.

43

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