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In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
Type:
Journal
Info:
2016 J. Phys. D: Appl. Phys. 49 115504
Date:
2015-12-14
Author Information
| Name | Institution |
|---|---|
| Noémi Leick | Eindhoven University of Technology |
| J. W. Weber | Eindhoven University of Technology |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
| Matthieu J. Weber | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Pt
Plasma Pd
Thermal Ru
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Ellipsometry
Characteristic: Dielectric Function
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Resistivity, Sheet Resistance
Analysis: FTIR reflectance
Substrates
| Silicon |
| Al2O3 |
Notes
| 529 |