Publication Information

Title: Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu

Type: Journal

Info: Journal of Alloys and Compounds, Volume 663, 2016, Pages 651 - 658

Date: 2015-12-20

DOI: http://dx.doi.org/10.1016/j.jallcom.2015.12.148

Author Information

Name

Institution

Yeungnam University

Yeungnam University

Korean Basic Science Institute

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Brown University

Incheon National University

Yeungnam University

Films

Plasma MoN using Unknown

Deposition Temperature = 300C

0-0-0

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

Unknown

Conformality, Step Coverage

Unknown

Unknown

Resistivity, Sheet Resistance

Unknown

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

SiO2

Keywords

Notes

487

Disclaimer

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