Publication Information

Title: Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma

Type: Journal

Info: Materials Letters, Volume 166, Pages 163 - 166

Date: 2015-12-10

DOI: http://dx.doi.org/10.1016/j.matlet.2015.12.049

Author Information

Name

Institution

Pusan National University

Pusan National University

Korean Basic Science Institute

Incheon National University

Korea Maritime and Ocean University

Hynix Semiconductor

Hynix Semiconductor

Pusan National University

Films

Deposition Temperature Range = 150-350C

7646-78-8

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam alpha-SE

Refractive Index

Ellipsometry

J.A. Woollam alpha-SE

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Rigaku Ultima IV

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Resistivity, Sheet Resistance

van der Pauw sheet resistance

Ecopia HMS-3000

Mobility

van der Pauw sheet resistance

Ecopia HMS-3000

Carrier Concentration

van der Pauw sheet resistance

Ecopia HMS-3000

Corrosion Potential

Potentiodynamic Polarization Test

Princeton Applied Research VersaSTAT4

Corrosion Current Density

Potentiodynamic Polarization Test

Princeton Applied Research VersaSTAT4

Substrates

Si(100)

Corning XG Glass

Stainless Steel 316L

Keywords

Notes

519

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