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Ru thin film grown on TaN by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 517 (2009) 4689 - 4693
Date:
2009-03-02
Author Information
| Name | Institution |
|---|---|
| Qi Xie | Fudan University |
| Yu-Long Jiang | Fudan University |
| Jan Musschoot | Ghent University |
| Davy Deduytsche | Ghent University |
| Christophe Detavernier | Ghent University |
| Ronald L. Van Meirhaeghe | Ghent University |
| Sven Van den Berghe | Belgian Nuclear Research Centre SCK-CEN |
| Guo-Ping Ru | Fudan University |
| Bing-Zong Li | Fudan University |
| Xin-Ping Qu | Fudan University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thermal Stability
Analysis: XRD, X-Ray Diffraction
Characteristic: Diffusion Barrier Properties
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Substrates
| Si(100) |
| TaN |
Notes
| 756 |