Chemical Binding Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Chemical Binding returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
2	Band alignment of Al2O3 with (-201) β-Ga2O3
3	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
4	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
5	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
6	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
7	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
8	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
9	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
10	In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
11	Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
12	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
13	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
14	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
15	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
16	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
17	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
18	Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
19	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
20	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
21	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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