Extinction Coefficient Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Extinction Coefficient returned 70 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
2Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
3Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
4Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
5Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
6Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
7Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
8Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
9Plasma-enhanced atomic layer deposition of tungsten nitride
10Plasma-enhanced atomic layer deposition of superconducting niobium nitride
11Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
12Thin film GaP for solar cell application
13Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
14Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
15Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
16Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
17Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
18Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
19Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
20Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
21Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
22Plasma-enhanced atomic layer deposition of vanadium nitride
23Plasma enhanced atomic layer deposition of gallium sulfide thin films
24Plasma-enhanced atomic layer deposition of titanium vanadium nitride
25Properties of AlN grown by plasma enhanced atomic layer deposition
26Remote Plasma ALD of Platinum and Platinum Oxide Films
27Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
28Optical properties and bandgap evolution of ALD HfSiOx films
29Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
30PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
31Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
32Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
33Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
34Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
35Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
36A route to low temperature growth of single crystal GaN on sapphire
37Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
38Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
39Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
40An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
41Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
42Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
43Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
44Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
45Plasma enhanced atomic layer deposition of aluminum sulfide thin films
46Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
47Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
48Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
49Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
50Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
51Atomic layer deposition of InN using trimethylindium and ammonia plasma
52Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
53Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
54Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
55Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
56Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
57In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
58Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
59Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
60Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods