Extinction Coefficient Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Extinction Coefficient returned 68 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
2Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
3Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
4Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
5Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
6Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
7Atomic layer deposition of InN using trimethylindium and ammonia plasma
8Optical properties and bandgap evolution of ALD HfSiOx films
9Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
10A route to low temperature growth of single crystal GaN on sapphire
11Properties of AlN grown by plasma enhanced atomic layer deposition
12Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
13Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
14Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
15Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
16Plasma-enhanced atomic layer deposition of tungsten nitride
17Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
18Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
19Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
20Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
21Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
22An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
23Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
24Plasma enhanced atomic layer deposition of aluminum sulfide thin films
25Remote Plasma ALD of Platinum and Platinum Oxide Films
26Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
27Plasma enhanced atomic layer deposition of gallium sulfide thin films
28In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
29Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
30Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
31Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
32Plasma-enhanced atomic layer deposition of titanium vanadium nitride
33Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
34Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
35Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
36Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
37Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
38PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
39Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
40Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
41Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
42Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
43Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
44Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
45Plasma-enhanced atomic layer deposition of superconducting niobium nitride
46Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
47Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
48Plasma-enhanced atomic layer deposition of vanadium nitride
49Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
50Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
51Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
52Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
53Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
54Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
55Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
56Thin film GaP for solar cell application
57Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
58Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure