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Plasma Species Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Plasma Species returned 59 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
2Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
3In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
4Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
5Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
6Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
7Atomic layer deposition of InN using trimethylindium and ammonia plasma
8Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
9Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
10Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
11Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
12Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
13Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
14Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
15Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
16Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
17Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
18Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
19Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
20Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
21Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
22Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
23Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
24Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
25Optical in situ monitoring of plasma-enhanced atomic layer deposition process
26Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
27Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
28Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
29Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
30Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
31Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
32Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
33Plasma enhanced atomic layer deposition of aluminum sulfide thin films
34Low temperature plasma enhanced deposition of GaP films on Si substrate
35Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
36Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
37Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
38Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
39Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
40Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
41The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
42Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
43Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
44The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
45Plasma enhanced atomic layer deposition of zinc sulfide thin films
46Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
47Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
48Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
49Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
50The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
51Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
52High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
53Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
54Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
55Innovative remote plasma source for atomic layer deposition for GaN devices
56Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
57Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
58Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
59Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma