Plasma Species Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
2Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
3Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
4Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
5Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
6Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
7Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
8High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
9Low temperature plasma enhanced deposition of GaP films on Si substrate
10The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
11The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
12Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
13Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
14Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
15Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
16Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
17Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
18Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
19Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
20The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
21Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
22Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
23Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
24Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
25Plasma enhanced atomic layer deposition of aluminum sulfide thin films
26Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
27Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
28Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
29Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
30Plasma enhanced atomic layer deposition of zinc sulfide thin films
31Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
32Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
33Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
34Optical in situ monitoring of plasma-enhanced atomic layer deposition process
35Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
36Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
37Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
38Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
39Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
40Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
41Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
42Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
43Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
44Atomic layer deposition of InN using trimethylindium and ammonia plasma
45Innovative remote plasma source for atomic layer deposition for GaN devices
46Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
47Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
48Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
49In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
50Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
51Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
52Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
53Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
54Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
55Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
56Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
57Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition