Plasma Species Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Plasma Species returned 32 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
2Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
3Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
4Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
5Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
6Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
7Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
8Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
9Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
10Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
11Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
12Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
13In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
14Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
15Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
16Low temperature plasma enhanced deposition of GaP films on Si substrate
17Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
18Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
19Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
20Plasma enhanced atomic layer deposition of aluminum sulfide thin films
21Plasma enhanced atomic layer deposition of zinc sulfide thin films
22Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
23Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
24Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
25Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
26Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
27Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
28Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
29Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
30The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
31Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
32Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition


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