Plasma Species Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Plasma Species returned 28 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
2Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
3Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
4Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
5Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
6Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
7Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
8Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
9Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
10Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
11Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
12Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
13In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
14Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
15Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
16Low temperature plasma enhanced deposition of GaP films on Si substrate
17Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
18Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
19Plasma enhanced atomic layer deposition of aluminum sulfide thin films
20Plasma enhanced atomic layer deposition of zinc sulfide thin films
21Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
22Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
23Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
24Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
25Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
26Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
27The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
28Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition


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