Plasma Species Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Plasma Species returned 47 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
2Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
3Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
4Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
5Atomic layer deposition of InN using trimethylindium and ammonia plasma
6Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
7Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
8Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
9Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
10Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
11Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
12Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
13Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
14Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
15Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
16Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
17Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
18Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
19Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
20High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
21In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
22Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
23Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
24Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
25Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
26Low temperature plasma enhanced deposition of GaP films on Si substrate
27Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
28Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
29Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
30Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
31Plasma enhanced atomic layer deposition of aluminum sulfide thin films
32Plasma enhanced atomic layer deposition of zinc sulfide thin films
33Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
34Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
35Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
36Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
37Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
38Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
39Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
40Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
41Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
42Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
43Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
44The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
45The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
46Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
47Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition