Gas Phase Species Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Gas Phase Species returned 49 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
2Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
3New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
4Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
5Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
6The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
7Plasma enhanced atomic layer deposition of aluminum sulfide thin films
8Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
9Fundamental beam studies of radical enhanced atomic layer deposition of TiN
10In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
11Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
12Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
13Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
14Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
15Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
16Plasma enhanced atomic layer deposition of zinc sulfide thin films
17Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
18Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
19Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
20Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
21Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
22Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
23Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
24Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
25Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
26The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
27The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
28Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
29Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
30Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
31Plasma enhanced atomic layer deposition of gallium sulfide thin films
32The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
33Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
34Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
35Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
36Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
37Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
38Plasma enhanced atomic layer deposition of Ga2O3 thin films
39Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
40Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
41In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
42Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
43Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
44Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
45Plasma Enhanced Atomic Layer Deposition on Powders
46Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
47Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
48Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
49Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma