Gas Phase Species Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Gas Phase Species returned 49 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
2New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
3Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
4Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
5Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
6Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
7Plasma Enhanced Atomic Layer Deposition on Powders
8The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
9Plasma enhanced atomic layer deposition of Ga2O3 thin films
10Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
11Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
12Fundamental beam studies of radical enhanced atomic layer deposition of TiN
13The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
14Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
15Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
16Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
17Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
18Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
19Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
20Plasma enhanced atomic layer deposition of aluminum sulfide thin films
21Plasma enhanced atomic layer deposition of gallium sulfide thin films
22Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
23Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
24Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
25Plasma enhanced atomic layer deposition of zinc sulfide thin films
26Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
27Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
28Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
29In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
30Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
31Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
32Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
33The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
34Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
35The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
36Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
37Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
38Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
39Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
40Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
41Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
42Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
43Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
44Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
45Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
46Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
47In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
48Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
49Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth