Diffusion Barrier Properties Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Diffusion Barrier Properties returned 41 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
2Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
3Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
4A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
5Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
6Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
7Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
8Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
9Atomic layer deposition of titanium nitride from TDMAT precursor
10Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
11Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
12Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
13Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
14Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
15Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
16Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
17From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
18Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
19Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
20Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
21Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
22Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
23TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
24The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
25The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
26Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
27Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
28Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
29Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
30Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
31Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
32Ru thin film grown on TaN by plasma enhanced atomic layer deposition
33Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
34Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
35Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
36Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
37An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
38Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
39Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
41Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets