Unknown Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
2Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
3Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
4Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
5Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
6Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
7Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
8Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
9Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
10Optical and Electrical Properties of TixSi1-xOy Films
11Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
12Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
13Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
14Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
15Trilayer Tunnel Selectors for Memristor Memory Cells
16Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
17Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
18A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
19Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
20The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
21Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
22Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
23Room-Temperature Atomic Layer Deposition of Platinum
24Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
25Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
26Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
27Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
28Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
29High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
30Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
31Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
32Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
33Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
34The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
35ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
36Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
37Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
38Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
39PEALD YSZ-based bilayer electrolyte for thin film-solid oxide fuel cells
40Densification of Thin Aluminum Oxide Films by Thermal Treatments
41Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process