| 1 | Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms |
| 2 | Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation |
| 3 | ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications |
| 4 | Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor |
| 5 | Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition |
| 6 | Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer |
| 7 | Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation |
| 8 | Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films |
| 9 | Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process |
| 10 | Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure |
| 11 | Densification of Thin Aluminum Oxide Films by Thermal Treatments |
| 12 | Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor |
| 13 | Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors |
| 14 | Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure |
| 15 | Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD) |
| 16 | Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN |
| 17 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
| 18 | Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer |
| 19 | Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications |
| 20 | Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition |
| 21 | High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates |
| 22 | Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN |
| 23 | Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide |
| 24 | Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation |
| 25 | Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene |
| 26 | Localized defect states and charge trapping in atomic layer deposited-Al2O3 films |
| 27 | Optical and Electrical Properties of TixSi1-xOy Films |
| 28 | PEALD YSZ-based bilayer electrolyte for thin film-solid oxide fuel cells |
| 29 | Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride |
| 30 | Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature |
| 31 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
| 32 | Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals |
| 33 | Room-Temperature Atomic Layer Deposition of Platinum |
| 34 | Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices |
| 35 | Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance |
| 36 | The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain |
| 37 | Trilayer Tunnel Selectors for Memristor Memory Cells |