Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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PEALD YSZ-based bilayer electrolyte for thin film-solid oxide fuel cells

Type:
Journal
Info:
Nanotechnology 27 (2016) 415402
Date:
2016-07-28
DOI:
https://doi.org/10.1088/0957-4484/27/41/415402

Author Information

Name Institution
Wonjong YuSeoul National University
Gu Young ChoSeoul National University
Soon Wook HongHanyang University
Yeageun LeeSeoul National University
Young-Beom KimSeoul National University
Jihwan AnSeoul National University
Suk Won ChaSeoul National University of Science and Technology

Films

Plasma YSZ

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Open Circuit Voltage
Analysis: -
Diagnostic: -

Characteristic: Power Density
Analysis: -
Diagnostic: -

Characteristic: Unknown
Analysis: EIS, Electrochemical Impedance Spectroscopy
Diagnostic: -

Substrates

YDC, Yttria Doped Ceria

Notes

856