Fixed Charge Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Fixed Charge returned 31 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
2Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
3Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
4Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
5Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
6Characteristics of HfO2 thin films grown by plasma atomic layer deposition
7Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
8Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
9Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
10Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
11Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
12Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
13Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
14Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
15Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
16Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
17Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
18Improved understanding of recombination at the Si/Al2O3 interface
19Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
20Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
21Low-thermal budget flash light annealing for Al2O3 surface passivation
22On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
23Passivation effects of atomic-layer-deposited aluminum oxide
24Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
25Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
26Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
27Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
28Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
29Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
30Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
31Trapped charge densities in Al2O3-based silicon surface passivation layers


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