Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Transmittance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Transmittance returned 58 record(s).

NumberTitle
1Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
2Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
3A route to low temperature growth of single crystal GaN on sapphire
4Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
5Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
6Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
7Plasma enhanced atomic layer deposition of gallium sulfide thin films
8Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
9Plasma enhanced atomic layer deposition of zinc sulfide thin films
10Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
11High-Reflective Coatings For Ground and Space Based Applications
12A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
13Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
14Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
15Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
16Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
17Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
18Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
19Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
20Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
21Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
22Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
23Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
24Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
25All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
26Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
27From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
28Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
29Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
30Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
31High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
32Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
33Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
34Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
35Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
36Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
37Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
38Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
39Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
40Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
41Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
42Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
43Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
44Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
45Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
46Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
47Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
48ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
49Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
50Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
51Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition