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Stress Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Stress returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
2Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
3Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
4Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
5Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
6Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
7Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
8PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
9Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
10Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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