Stress Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Stress returned 31 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
2Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
3Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
4Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
5Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
6Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
7Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
8Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
9Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
10Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
11Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
12Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
13Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
14Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
15Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
16PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
17Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
18Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
19Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
20Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
21Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
22Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
23Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
24Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
25Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
26Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
27Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
28Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
29Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
30Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
31Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition