Stress Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Stress returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
2Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
3Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
4Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
5Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
6Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
7Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
8Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
9PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
10Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
11Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode


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