Stress Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Stress returned 28 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
2Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
3Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
4Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
5Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
6Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
7Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
8Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
9Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
10Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
11Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
12Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
13Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
14Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
15Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
16Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
17Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
18Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
19Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
20PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
21Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
22Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
23Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
24Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
25Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
26Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
27Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
28Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode