Stress Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Stress returned 30 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
2PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
3Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
4Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
5Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
6Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
7Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
8Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
9Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
10Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
11Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
12Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
13Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
14Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
15Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
16Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
17Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
18Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
19Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
20Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
21Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
22Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
23Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
24Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
25Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
26Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
27Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
28Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
29Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
30Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition