Stress Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Stress returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
2Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
3Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
4Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
5Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
6Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
7Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
8Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
9Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
10Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
11Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
12Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
13Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
14Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
15Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
16PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
17Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
18Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
19Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode


© 2014-2020